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Chemically-amplified photoresist – Invented by Hiroshi Ito, C. Grant Willson and J. M. J. Fréchet at IBM circa 1980, which was 5-10 times more sensitive to ultraviolet light. IBM introduced chemically amplified photoresist for DRAM production in the mid-1980s. Microprocessor architects report that since around 2010, semiconductor advancement has slowed industry-wide below the pace predicted …
